This inventor holds 4 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1999-2001.
Company Filing History:
Years Active: 1999-2001
Title: Je Wang: Innovator in Microelectronics
Introduction
Je Wang is a prominent inventor based in Hsin-chu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the development of advanced dielectric layers and methods for preventing delamination in semiconductor manufacturing. With a total of 4 patents to his name, Wang's work has had a substantial impact on the reliability and efficiency of integrated circuits.
Latest Patents
One of Wang's latest patents is a method for preventing delamination of APCVD BPSG films. This innovative technique involves forming BPSG layers over PECVD silicon oxide layers using atmospheric chemical vapor deposition with ozone and TEOS. The method effectively prevents the formation of voids in deep depressions found between metallization lines or closely spaced polysilicon structures in flash memory integrated circuits. By depositing the BPSG layer at an ozone/TEOS flow rate ratio of 12:1 or greater, Wang's method reduces shrinkage and high stresses during planarization reflow, thereby enhancing the integrity of the circuit.
Another notable patent focuses on the formation of a silicon oxide dielectric layer with enhanced density and reduced mobile species. This method employs ozone-assisted near atmospheric pressure thermal chemical vapor deposition (APCVD) from tetra-ethyl-ortho-silicate (TEOS) vapor. The resulting blanket undoped silicon oxide glass dielectric layer serves as a barrier to diffusion, which mitigates hot carrier injection effects and improves device reliability.
Career Highlights
Je Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has allowed him to push the boundaries of microelectronics technology and contribute to the advancement of semiconductor fabrication processes.
Collaborations
Wang has collaborated with notable colleagues, including Han-Chung Chen and Chiarn-Lung Lee. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Je Wang's contributions to microelectronics through his innovative patents and work at TSMC highlight his role as a key figure in the industry. His advancements in dielectric layer formation and methods to prevent delamination are vital for enhancing the reliability of modern integrated circuits.