This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2025-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025-2026
Title: Jasper Winters - Innovator in Lithographic Technology
Introduction
Jasper Winters is a notable inventor based in Vijfhuizen, Netherlands. He has made significant contributions to the field of lithographic tools, showcasing his expertise through his innovative patent.
Latest Patents
Jasper holds a patent titled "Systems and methods for lithographic tools with increased tolerances." This patent describes a method of using a lithographic tool that involves scanning a substrate relative to two micro-lens arrays (MLAs). The first MLA consists of functional lenslets and extra lenslets, allowing for the delivery of light through these lenslets to form a pattern on the substrate. The method addresses gaps in the pattern caused by misalignment between the lenslets, ensuring a more precise lithographic process.
Career Highlights
Jasper Winters is currently employed at ASML Netherlands B.V., a leading company in the development of advanced lithography systems. His work at ASML has positioned him at the forefront of technological advancements in the semiconductor industry.
Collaborations
Jasper collaborates with esteemed colleagues, including John Erwin Van Zwer and Johannes Marcus Van Der Lans. Their combined expertise contributes to the innovative projects at ASML.
Conclusion
Jasper Winters is a prominent figure in the field of lithographic technology, with a patent that enhances the precision of lithographic tools. His contributions continue to influence advancements in the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile