The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Jan. 23, 2024
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jasper Winters, Nieuw Vennep, NL;
Erwin John Van Zwet, Pijnacker, NL;
Marcus Johannes Van Der Lans, Hillegom, NL;
Pieter Willem Herman De Jager, Middelbeers, NL;
Geerten Frans Ijsbrand Kramer, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70291 (2013.01); G03F 7/70508 (2013.01); G03F 7/70558 (2013.01);
Abstract
A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.