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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12461449 B1

PDFFull Text
Date of Patent:
Nov. 04, 2025

Filed:

Jun. 17, 2022

Systems and methods for lithographic tools with increased tolerances

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Jasper Winters, Vieuw Vennep, NL;

John Erwin Van Zwer, Pijnacker, NL;

Johannes Marcus Van Der Lans, Hillegom, NL;

Willem Herman Pieter De Jager, Middelbeers, NL;

Anton Emiel Van De Ven, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman, LLP

Primary Examiner:

Peter B Kim

Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70275 (2013.01); G03F 7/70366 (2013.01); G03F 7/70475 (2013.01); G03F 7/70525 (2013.01);
Abstract

A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functional lenslets and extra lenslets and the scanning includes delivering light through the lenslets of the first MLA and second MLA to the substrate. The delivering includes delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light through the extra lenslets to fill the gaps in the pattern.

Find Patent Forward Citations

Winters, Jasper. (2025). Systems and methods for lithographic tools with increased tolerances (U.S. Patent No. 12461449). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12461449

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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