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For the Inventor, By the Inventor

Eindhoven, Netherlands

Jan Visser

This inventor holds 10 USPTO granted patents. Top assignee: U.S. Philips Corporation. Active years: 1976-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Visser. Retrieved from https://idiyas.com/inventor/jan-visser

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 100.0

Average Co-Inventor Count = 1.2

ph-index = 6

Forward Citations = 123(Granted Patents)


Company Filing History:

goldMedal10 out of 14,087 
 
U.S. Philips Corporation
 patents

Years Active: 1976-2000

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10 patents (USPTO):Explore Patents
1. 6059938 - Method of reducing particle contamination during sputtering (2000-05-09),
2. 5747362 - Method of manufacturing a semiconductor device in which a layer of (1998-05-05),
3. 5356477 - Device for providing a substrate with a surface layer from a vapor (1994-10-18),
4. 5322710 - Method of providing a substrate with a surface layer from a vapor (1994-06-21),
5. 5310703 - Method of manufacturing a semiconductor device, in which photoresist on (1994-05-10),
6. 5177878 - Apparatus and method for treating flat substrate under reduced pressure (1993-01-12),
7. 4647338 - Method of manufacturing a semiconductor device, in which a semiconductor (1987-03-03),
8. 4427524 - Magnetron cathode sputtering system (1984-01-24),
9. 4392939 - Magnetron cathode sputtering system (1983-07-12),
10. 3977849 - Sorption pump (1976-08-31),

Title: Jan Visser: Innovator in Semiconductor Technology

Introduction

Jan Visser is a prominent inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His innovative methods have advanced the processes involved in sputtering and semiconductor device manufacturing.

Latest Patents

One of Jan Visser's latest patents is a method of reducing particle contamination during sputtering. This method describes how to minimize contamination by ensuring that material deposited on a surface of a chamber component has better adhesion. The process involves bombarding the surface with ions from a gas discharge, which enhances the adhesion of the material detached from the target plate. Another notable patent involves a method of manufacturing a semiconductor device, where a layer of material is deposited on a semiconductor wafer. This method optimizes the use of process gas, resulting in a more uniform layer and reduced gas consumption.

Career Highlights

Jan Visser has had a successful career at U.S. Philips Corporation, where he has been instrumental in developing innovative technologies. His work has not only contributed to the company's success but has also had a lasting impact on the semiconductor industry.

Collaborations

Jan has collaborated with notable colleagues such as Jacobus E Crombeen and Gary E Thomas. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their field.

Conclusion

Jan Visser's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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