Jan Stopka

Title: Jan Stopka: Innovator in Beam Positioning Technologies

Introduction

Jan Stopka is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of beam positioning technologies, holding a total of 4 patents. His work focuses on enhancing the precision and efficiency of multi-beam scanning systems.

Latest Patents

One of Jan Stopka's latest patents is a method and system for determining beam position. This innovation involves scanning beamlets over two sample regions to acquire multiple cell images. The method allows for the determination of each beamlet's position based on the corresponding cell images from both scans. Another significant patent addresses the correction of first-order astigmatism and distortion in multi-beam scanning electron microscopes. This technology utilizes an electron source, an aperture plate, and an electron column with stigmators to correct optical imperfections, thereby improving imaging quality.

Career Highlights

Jan Stopka is currently employed at FEI Company, where he continues to develop advanced technologies in electron microscopy and beam positioning. His expertise in these areas has positioned him as a key player in the field of precision imaging.

Collaborations

Jan has collaborated with several talented individuals, including Bohuslav Sed'a and Radovan Vasina. These partnerships have fostered innovation and contributed to the successful development of his patented technologies.

Conclusion

Jan Stopka's work in beam positioning technologies exemplifies the impact of innovative thinking in scientific research. His patents not only advance the field of electron microscopy but also enhance the capabilities of imaging technologies.