Fei Comapny

Jan Stopka

Bohuslav Sed'a

Petr Hlavenka

Pavel Stejskal

Libor Novák

Radovan Vašina

Radim Šejnoha

Methods and systems to determine positions of multiple beamlets includes performing a first scan by scanning the beamlets over a first sample region and acquiring multiple cell images; and performing a second scan by scanning the beamlets over a second sample region and acquiring multiple cell images. Each cell image corresponds to a beamlet, and at least a part of an overlapped region between the first sample region and the second sample region is scanned by multiple beamlets during both the first scan and the second scan. Position of each beamlet may then be determined based on the corresponding cell images acquired during the first scan and the second scan.

Method and system for determining beam position

An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.

Method to correct first order astigmatism and first order distortion in multi-beam scanning electron microscopes

The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.

Methods and systems for aligning a multi-beam system

The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.

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Brno, Czechia

Jan Stopka