The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Jun. 27, 2023
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Jan Stopka, Rašovice, CZ;

Tomáš Radlička, Brno, CZ;

Martin Oral, Brno, CZ;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/14 (2006.01); H01J 37/20 (2006.01); H01J 37/21 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/14 (2013.01); H01J 37/20 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01); H01J 2237/1035 (2013.01); H01J 2237/141 (2013.01); H01J 2237/1415 (2013.01);
Abstract

Magnetic lenses, charged particle microscope systems including the same, and associated methods. In an example, a magnetic lens is configured to direct a charged particle beam to a sample location and comprises a plurality of pole pieces and at least two independent coils. The magnetic lens operates as an objective lens with variable main objective plane without immersing a sample in a magnetic field. The variable main objective plane permits selective adjustment of a magnification of the charged particle beam at the focal plane without immersing the sample location in the magnetic fields produced by coils of the magnetic lens. In an example, a charged particle microscope system comprises a charged particle source, a sample holder, and a magnetic objective lens. In an example, a method comprises positioning a sample relative to a magnetic lens and operating the magnetic lens to focus a charged particle beam to a focus location.


Find Patent Forward Citations

Stopka, Jan. (2026). Magnetic lenses, charged particle microscope systems including the same, and associated methods (U.S. Patent No. 12633490). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12633490

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…