The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Mar. 30, 2022
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Jan Stopka, Brno, CZ;
Bohuslav Sed'A, Brno, CZ;
Radovan Va{hacek over (s)}ina, Brno, CZ;
Radim {hacek over (S)}ejnoha, Brno, CZ;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); G06T 7/70 (2017.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); G06T 7/70 (2017.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/1534 (2013.01);
Abstract
The beamlets in a multi-beam microscopy system are aligned based on coefficients of a fitted aberration model. In particular, an illuminator for directing the beamlets towards the sample is adjusted based on the coefficients to correct the aberrations. The coefficients are obtained based on measured beamlets' positions in the sample plane.