Location History:
- Lelystad, NL (1997)
- Delft, NL (2001 - 2013)
Company Filing History:
4 out of 4,902 
1 out of 1,010 
1 out of 82 Years Active: 1997-2013
Title: The Inventive Mind of Jan Hopman: Pioneering Lithographic Advancements
Introduction:
Jan Hopman, a brilliant inventor hailing from Delft, NL, has made significant strides in the realm of lithographic technology. With a total of 6 patents under his name, Hopman's innovative spirit shines through in his latest patent developments.
Latest Patents:
1. "Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus": Hopman's invention introduces a novel method for manufacturing an electrostatic clamp tailored to securely hold articles in lithographic apparatuses.
2. "Lithographic apparatus, device manufacturing method, and device manufactured thereby": This patent showcases a lithographic projection apparatus designed with unique features to enhance the precision and stability of the article holder during the lithographic process.
Career Highlights:
Hopman's expertise has been honed through his tenure at prominent companies such as ASML Netherlands B.V. and TNO (Nederlandse Organisatie voor Toegepast-Natuurwetenschappelijk Onderzoek). His contributions have not only elevated the technologies within these organizations but have also left a lasting impact on the field of lithography.
Collaborations:
Throughout his career, Jan Hopman has collaborated closely with esteemed professionals in the industry. Notable coworkers include Joost Jeroen Ottens and Koen Jacobus Johannes Maria Zaal, with whom he has synergized to push the boundaries of lithographic innovation.
Conclusion:
In conclusion, Jan Hopman's inventive genius and dedication to advancing lithographic technologies have cemented his position as a trailblazer in the field. His patents stand as a testament to his unwavering commitment to driving progress and shaping the future of lithography.