The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Nov. 16, 2004
Applicants:
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jan Hopman, Delft, NL;
Inventors:
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jan Hopman, Delft, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least one of the bonded layers includes a plurality of recesses facing another of the bonded layers, so as to reduce a bonding surface between the bonded layers.