The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Feb. 03, 2011
Hubert Adriaan Van Mierlo, Maassluis, NL;
Erik Leonardus Ham, Steenbergen, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Hendrik Antony Johannes Neerhof, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Johannes Adrianus Petrus Leijtens, Bleiswijk, NL;
Marco Le Kluse, Maassluis, NL;
Jan Hopman, Delft, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Hubert Adriaan Van Mierlo, Maassluis, NL;
Erik Leonardus Ham, Steenbergen, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Hendrik Antony Johannes Neerhof, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Johannes Adrianus Petrus Leijtens, Bleiswijk, NL;
Marco Le Kluse, Maassluis, NL;
Jan Hopman, Delft, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.