The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2006

Filed:

Jul. 22, 2004
Applicants:

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;

Joost Jeroen Ottens, Veldhoven, NL;

Jan Hopman, Delft, NL;

Inventors:

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;

Joost Jeroen Ottens, Veldhoven, NL;

Jan Hopman, Delft, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01); G03B 27/58 (2006.01); H02N 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.


Find Patent Forward Citations

Loading…