The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Dec. 21, 2005
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Endhoven, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Marco Le Kluse, Maassluis, NL;
Jan Hopman, Delft, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Endhoven, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Marco Le Kluse, Maassluis, NL;
Jan Hopman, Delft, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.