James Moreland

Title: Innovations by James Moreland

Introduction

James Moreland is an accomplished inventor based in Portland, OR (US). He has made significant contributions to the field of semiconducting materials, holding two patents that showcase his innovative approach to technology.

Latest Patents

James Moreland's latest patents include a film or layer of semiconducting material and a process for producing this film or layer. The first patent focuses on the manufacturing of SOI wafers, which are designed to have very thin device layers of high surface quality. This layer is characterized by a thickness of ≤20 nm, an HF density of ≤0.1/cm, and a surface roughness of 0.2 nm RMS. The second patent pertains to a film or layer made of semi-conductive material with low defect density in the thin layer. It also describes a SOI-disk with a thin silicon layer that exhibits low surface roughness, defect density, and thickness variations. The method for producing this film or layer involves several steps, including producing structures from semi-conductive material with periodically repeated recesses, thermally treating the material, and separating the closed layer from the remainder of the semi-conductive material.

Career Highlights

James Moreland is currently employed at Siltronic AG, where he continues to push the boundaries of innovation in semiconducting materials. His work has been instrumental in advancing the technology used in various electronic applications.

Collaborations

James has collaborated with notable coworkers, including Brian Murphy and Reinhold Wahlich, who have contributed to his projects and innovations.

Conclusion

James Moreland's contributions to the field of semiconducting materials through his patents and work at Siltronic AG highlight his role as a significant inventor in the industry. His innovative methods and collaborations continue to influence advancements in technology.