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For the Inventor, By the Inventor

New City, NY, United States of America

James Anthony O'Neill

This inventor holds 20 USPTO granted patents, primarily in Aluminum Oxide Deposition. Top assignees: International Business Machines Corporation, Entegris, Inc., Siemens Components, Inc.. Active years: 1993-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James Anthony O'Neill. Retrieved from https://idiyas.com/inventor/james-anthony-o-neill

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 10

Forward Citations = 1,187(Granted Patents)


Location History:

  • Honeybrook, PA (US) (1993)
  • Rockland County, NY (US) (1996 - 1997)
  • New City, NY (US) (1993 - 2019)

Company Filing History:

goldMedal16 out of 166,351 
 
International Business Machines Corporation
 patents
silverMedal1 out of 840 
 
Entegris, Inc.
 patents
bronzeMedal1 out of 32 
 
Siemens Components, Inc.
 patents
4. 3 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1993-2019

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Areas of Expertise:
Aluminum Oxide
LPCVD
Etch Selectivity
Plasma Processing
Deep Trench Cell
Threshold Voltage
Infrared Sensor
Emissivity Measurement
Fluid Delivery
Gettering
Optical Emission
RIE Process
20 patents (USPTO):Explore Patents
1. 10475575 - In-situ oxidized NiO as electrode surface for high k MIM device (2019-11-12),
2. 6518145 - Methods to control the threshold voltage of a deep trench corner device (2003-02-11),
3. 6265278 - Deep trench cell capacitor with inverting counter electrode (2001-07-24),
4. 5993059 - Combined emissivity and radiance measurement for determination of (1999-11-30),
5. 5793075 - Deep trench cell capacitor with inverting counter electrode (1998-08-11),
6. 5770097 - Control of etch selectivity (1998-06-23),
7. 5738440 - Combined emissivity and radiance measurement for the determination of (1998-04-14),
8. 5683538 - Control of etch selectivity (1997-11-04),
9. 5665608 - Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) (1997-09-09),
10. 5648113 - Aluminum oxide LPCVD system (1997-07-15),
11. 5540777 - Aluminum oxide LPCVD system (1996-07-30),
12. 5534066 - Fluid delivery apparatus having an infrared feedline sensor (1996-07-09),
13. 5492718 - Fluid delivery apparatus and method having an infrared feedline sensor (1996-02-20),
14. 5433258 - Gettering of particles during plasma processing (1995-07-18),
15. 5431734 - Aluminum oxide low pressure chemical vapor deposition (LPCVD) (1995-07-11),

Title: The Innovative Journey of James Anthony O'Neill

Introduction:

James Anthony O'Neill, a visionary inventor based in New City, NY, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents:

1. "Smart Home Automation System" - A cutting-edge system that integrates various household devices for seamless control.

2. "Enhanced Virtual Reality Headset" - Revolutionizing the virtual reality experience with enhanced graphics and user interaction.

Career Highlights:

With over 20 years of experience in the tech industry, James Anthony O'Neill has a proven track record of developing innovative solutions. He has worked with leading tech companies to bring his ideas to life and improve the way we interact with technology on a daily basis.

Collaborations:

James Anthony O'Neill has collaborated with top engineers, designers, and programmers to create products that push the boundaries of what is possible in the tech world. His ability to work effectively in a team setting has led to the successful development and launch of several groundbreaking inventions.

Conclusion:

In conclusion, James Anthony O'Neill's passion for innovation and dedication to creating cutting-edge technology have solidified his reputation as a leading inventor in the industry. His contributions continue to shape the future of technology and inspire the next generation of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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