The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1997
Filed:
Sep. 30, 1994
Steven George Barbee, Dutchess County, NY (US);
Jonathan Daniel Chapple-Sokol, Chittenden County, VT (US);
Richard Anthony Conti, Westchester County, NY (US);
Richard Hsiao, Santa Clara County, CA (US);
James Anthony O'Neill, Rockland County, NY (US);
Narayana V Sarma, Dutchess County, NY (US);
Donald Leslie Wilson, Orange County, NY (US);
Justin Wai-Chow Wong, Chittenden County, VT (US);
Steven Paul Zuhoski, Dallas County, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process and apparatus for Al.sub.2 O.sub.3 CVD on silicon wafers using aluminum tri-isopropoxide in a high-volume production environment is presented. The conditions required to use ATI in a production environment and provide maximum utilization of ATI are first of all delivery of ATI via direct evaporation. The ATI source bottle is pumped out (bypassing substrates) until propene and isopropanol signals are reduced to 1% of process pressure before start of aluminum oxide deposition. Either IR spectroscopy or mass spectrometry can be used to provide a control signal to the microprocessor controller. Heating the supplied tetramer to 120.degree. C. for two hours assures complete conversion to trimer. The ATI is stored at 90.degree. C. to minimize decomposition during idle periods and allow recovery of trimer upon return to 120.degree. C. for two hours. During periods of demand, the ATI is held at 120.degree. C. to minimize decomposition.