The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1995
Filed:
Apr. 28, 1994
Applicant:
Inventors:
Jonathan D Chapple-Sokol, Poughkeepsie, NY (US);
Richard A Conti, Mt. Kisco, NY (US);
James A O'Neill, New City, NY (US);
Narayana V Sarma, Verbank, NY (US);
Donald L Wilson, New Windsor, NY (US);
Justin W-C. Wong, South Burlington, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
118712 ; 118688 ; 118689 ; 427-8 ; 216 60 ; 216 61 ;
Abstract
A method and apparatus for monitoring and controlling reactant vapors prior to chemical vapor deposition (CVD). The reactant vapors are monitored at full concentration without sampling as they are transported to a CVD reactor. Contaminants detected cause a process controller to switch the transport path to direct reactant vapors to a system pump.
Published as: