New Windsor, NY, United States of America

Donald L Wilson


Average Co-Inventor Count = 5.9

ph-index = 4

Forward Citations = 896(Granted Patents)


Company Filing History:


Years Active: 1995-2002

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: **Donald L. Wilson: A Pioneering Inventor in Wafer Processing Technologies**

Introduction

Donald L. Wilson, based in New Windsor, NY, has established himself as a notable inventor with a total of four patents to his name. His innovative work primarily focuses on enhancing methods and apparatuses related to wafer processing, significantly impacting the semiconductor industry.

Latest Patents

Among his latest contributions, Wilson has developed the "Apparatus and method for controlling wafer environment between thermal clean and thermal processing." This invention provides an advanced apparatus that controls wafer temperature and environment during critical processing stages. The design includes a batch processing fixture for maintaining wafers at an elevated temperature without substantial temperature fluctuation. Additionally, it features a single wafer processing apparatus that ensures a uniform temperature during rapid temperature changes, highlighting Wilson's focus on precision and efficiency. Another patent, the "Method of aluminum oxide low pressure chemical vapor deposition (LPCVD)," describes a technique for monitoring and controlling reactant vapors, enhancing the reliability of chemical vapor deposition processes.

Career Highlights

Donald L. Wilson is affiliated with the International Business Machines Corporation (IBM), where he plays a vital role in research and development. His work on wafer processing technologies exemplifies his commitment to advancing the semiconductor field and contributing to the efficiency of thermal processes.

Collaborations

Throughout his career, Wilson has collaborated with talented coworkers, including Richard Anthony Conti and Justin W. Wong. These partnerships have facilitated knowledge exchange and innovation, further enriching his contributions to the industry.

Conclusion

Donald L. Wilson stands out as a prominent inventor whose patents reflect significant advancements in wafer processing technologies. Through his work at IBM and his collaborations with other talented professionals, he continues to drive innovation within the semiconductor industry, shaping the future of this critical field.

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