Company Filing History:

9 out of 164,108

International Business Machines Corporation

Accent Optical Technologies, Inc.

patents

where one patent can have more than one assignee

Years Active: 2005-2015

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9 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9097989 - Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control (2015-08-04),

2. 9087740 - Fabrication of lithographic image fields using a proximity stitch metrology (2015-07-21),

3. 8339605 - Multilayer alignment and overlay target and measurement method (2012-12-25),

4. 8107079 - Multi layer alignment and overlay target and measurement method (2012-01-31),

5. 7876439 - Multi layer alignment and overlay target and measurement method (2011-01-25),

6. 7626702 - Overlay target and measurement method using reference and sub-grids (2009-12-01),

7. 7474401 - Multi-layer alignment and overlay target and measurement method (2009-01-06),

8. 7359054 - Overlay target and measurement method using reference and sub-grids (2008-04-15),

9. 6937337 - Overlay target and measurement method using reference and sub-grids (2005-08-30),

Title: Innovations of Jaime D Morillo

Introduction

Jaime D Morillo is a notable inventor based in Beacon, NY (US), recognized for his contributions to semiconductor manufacturing processes. With a total of 9 patents, Morillo has made significant advancements in the field, particularly in the areas of mask-to-wafer correlation and lithographic image fields.

Latest Patents

Among his latest patents is a method for mask-to-wafer correlation among multiple masking levels in semiconductor manufacturing. This innovative method involves creating compact targets that contain structure patterns suitable for critical dimension and overlay measurement. It includes measuring targets, determining overlay variation, and correlating mask and wafer measurements to distinguish between mask and lithography-induced variations. Another significant patent focuses on determining stitching errors in multiple lithographically exposed fields on a semiconductor layer. This method calculates petal position errors based on predetermined design distances, providing insights into stitching errors during the manufacturing process.

Career Highlights

Throughout his career, Jaime D Morillo has worked with prominent companies such as IBM and Nanometrics Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Morillo has collaborated with notable professionals in the field, including Christopher P Ausschnitt and Lewis A Binns. These collaborations have further enhanced his work and contributed to the advancement of semiconductor manufacturing techniques.

Conclusion

Jaime D Morillo's innovative work in semiconductor manufacturing has led to significant advancements in the industry. His patents reflect a deep understanding of complex processes and a commitment to improving technology.

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