Jae Seong Lee

Title: Innovations of Jae Seong Lee

Introduction

Jae Seong Lee is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of technology, particularly in the development of advanced processing apparatuses and etching methods. With a total of two patents to his name, Lee's work showcases his innovative spirit and technical expertise.

Latest Patents

One of Jae Seong Lee's latest patents is a supercritical processing apparatus. This apparatus includes an upper vessel with a first fluid hole at its center and a lower vessel with a second fluid hole. A space is defined between these vessels, allowing a substrate to be placed within. The upper vessel also features a first guide portion that gradually inclines downward toward the periphery from the first fluid hole. Another significant patent is a method and apparatus for etching a thin layer, specifically silicon nitride, formed on a substrate. This method involves supplying an etchant, consisting of phosphoric acid and water, to create a liquid layer on the substrate. The etching process is monitored by measuring the thickness of the liquid layer, allowing for adjustments in the concentration of the etchant to maintain optimal conditions.

Career Highlights

Jae Seong Lee is currently employed at Semes Co., Ltd., where he continues to innovate and develop new technologies. His work at the company has positioned him as a key player in the field of semiconductor processing.

Collaborations

Lee collaborates with talented coworkers, including Hae Won Choi and Ki Hoon Choi. Their combined expertise contributes to the advancement of technology within their organization.

Conclusion

Jae Seong Lee's contributions to the field of technology through his patents and work at Semes Co., Ltd. highlight his role as an influential inventor. His innovative approaches to processing apparatuses and etching methods demonstrate the importance of creativity and technical skill in advancing technology.