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For the Inventor, By the Inventor

Jericho, VT, United States of America

Jacek G Smolinski

USPTO Granted Patents = 15

Average Co-Inventor Count = 2.6

ph-index = 8

Forward Citations = 378(Granted Patents)


Location History:

  • Essex Junction, VT (US) (2012)
  • Jericho, VT (US) (1999 - 2013)

Company Filing History:

goldMedal15 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1999-2013

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15 patents (USPTO):
1. 8619236 - Determining lithographic set point using optical proximity correction verification simulation (2013-12-31),
2. 8219964 - Method for creating electrically testable patterns (2012-07-10),
3. 7562337 - OPC verification using auto-windowed regions (2009-07-14),
4. 7434185 - Method and apparatus for parallel data preparation and processing of integrated circuit graphical design data (2008-10-07),
5. 7269808 - Design verification (2007-09-11),
6. 6654488 - Fill pattern inspection (2003-11-25),
7. 6190836 - Methods for repair of photomasks (2001-02-20),
8. 6180953 - Cut and blast defect to avoid chrome roll over annealing (2001-01-30),
9. 6165649 - Methods for repair of photomasks (2000-12-26),
10. 6156461 - Method for repair of photomasks (2000-12-05),
11. 6090507 - Methods for repair of photomasks (2000-07-18),
12. 6074571 - Cut and blast defect to avoid chrome roll over annealing (2000-06-13),
13. 6048649 - Programmed defect mask with defects smaller than 0.1 .mu.m (2000-04-11),
14. 6030730 - Photomask repaired from black dot defect (2000-02-29),
15. 5978501 - Adaptive inspection method and system (1999-11-02),

Title: Jacek G Smolinski: Innovator in Lithographic Technology

Introduction

Jacek G Smolinski is a prominent inventor based in Jericho, Vermont, known for his significant contributions to lithographic technology. With a total of 15 patents to his name, he has made remarkable advancements in the field, particularly in the areas of optical proximity correction and electrically testable patterns.

Latest Patents

Among his latest patents is a method for determining lithographic set points using optical proximity correction verification simulation. This innovative approach involves a computer-implemented method that provides a model of a production lithographic process, analyzing it to ensure that structures on a production mask do not fail under various set points. Another notable patent is a method for creating electrically testable patterns, which focuses on designing patterns based on chip layouts. This method identifies critical sites and forms electrical test patterns that are sensitive to changes in the printed environment.

Career Highlights

Jacek Smolinski has built a successful career at International Business Machines Corporation (IBM), where he has been instrumental in developing cutting-edge technologies. His work has not only advanced the field of lithography but has also contributed to the overall progress of semiconductor manufacturing.

Collaborations

Throughout his career, Jacek has collaborated with notable colleagues, including Brian J Grenon and Richard Alan Haight. These partnerships have fostered innovation and have led to the successful development of various technologies in the industry.

Conclusion

Jacek G Smolinski's contributions to lithographic technology and his innovative patents have established him as a key figure in the field. His work continues to influence advancements in semiconductor manufacturing, showcasing the importance of innovation in technology.

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