The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Apr. 30, 1998
Ann Rand Burke, South Burlington, VT (US);
Denis Marc Rigaill, South Burlington, VT (US);
Jacek Grzegorz Smolinski, Jericho, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for making sublithographic structures, such as programmed defect masks. The method comprises the steps of forming a layer of base material on a substrate, the base material being selectively definable from the substrate, forming a layer of photosensitive material over the layer of material, selectively exposing a plurality of image segments in the photosensitive material in which segments are offset from each other by a sub-lithographic dimension in a first direction and a different dimension in a second direction and a sub-plurality of the segments pass over the layer of base material, and developing the photosensitive material to expose the layer within the sub-plurality of segments. Also provided is the resulting programmed defect mask with defects under 0.1 .mu.m in size.