This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Ann Rand Burke and Her Patent for Programmed Defect Masks.
Introduction
Ann Rand Burke is an inventor associated with South Burlington, Vermont, and International Business Machines Corporation. Her patent work addresses the fabrication of sublithographic structures for semiconductor applications.
Latest Patents
Burke is credited with 1 patent: “Programmed defect mask with defects smaller than 0.1 μm.” The patent describes a method for creating programmed defect masks with defects smaller than 0.1 micrometers. It involves forming layers of base and photosensitive materials, exposing offset image segments, and developing the photosensitive material to reveal selected areas of the base layer.
Career Highlights
Burke’s patent reflects work on precise patterning techniques that can produce structures below conventional lithographic dimensions. The disclosed method also provides a way to create programmed defects for use in mask-related applications.
Collaborations
The patent information names Denis Marc Rigaill and Jacek G. Smolinski as Burke’s coworkers. Her company affiliation is International Business Machines Corporation.
Conclusion
Ann Rand Burke’s patent documents a specialized approach to producing programmed defect masks with sub-0.1-micrometer features, highlighting her contribution to advanced patterning technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile