Denis Marc Rigaill is a notable inventor based in South Burlington, VT (US). He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on enhancing the detection of defects in photomasks, which are critical components in semiconductor manufacturing.

Latest Patents

One of his latest patents is a surface coating method to highlight transparent mask defects. This method involves applying a contrast-enhancing coating on the photomask and optically inspecting it for defects. The coating can be made from materials such as copper, aluminum, or molybdenum silicide, which alter the reflectivity or transmissivity of defects. Another significant patent is the multiple polarity mask exposure method. This method describes a process for forming a patterned mask over a substrate, utilizing two resist layers that are patterned using energy selective to each layer.

Career Highlights

Denis Marc Rigaill is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to develop innovative solutions that address challenges in the semiconductor industry. His patents reflect his commitment to advancing technology and improving manufacturing processes.

Collaborations

Denis has collaborated with notable colleagues, including David S O'Grady and Michael Straight Hibbs. These collaborations have contributed to the development of his innovative patents and have enhanced the research environment at IBM.

Conclusion

Denis Marc Rigaill's contributions to photomask technology through his patents demonstrate his expertise and dedication to innovation. His work continues to influence the semiconductor industry, paving the way for advancements in manufacturing processes.