The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Dec. 11, 2006
James A. Bruce, Williston, VT (US);
Gregory J. Dick, Beacon, NY (US);
Donald P. Perley, South Burlington, VT (US);
Jacek G. Smolinski, Jericho, VT (US);
James A. Bruce, Williston, VT (US);
Gregory J. Dick, Beacon, NY (US);
Donald P. Perley, South Burlington, VT (US);
Jacek G. Smolinski, Jericho, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for performing optical proximity correction ('OPC') verification in which features of concern of a photomask are identified using data relating to shapes of the photomask, an aerial image to be obtained using the photomask, or a photoresist image to be obtained in a photoimageable layer using the photomask. A plurality of areas of the photomask, aerial image or photoresist image are identified which incorporate the identified features of concern, where the plurality of identified areas occupy substantially less area than the total area of the photomask that is occupied by features. Enhanced OPC verification limited to the plurality of identified areas is then performed to identify problems of at least one of the photomask, aerial image or photoresist image.