The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
Jan. 03, 1997
Applicant:
Inventors:
Karen Marie Badger, Milton, VT (US);
Brian Joseph Grenon, Colchester, VT (US);
David Shawn O'Grady, Jericho, VT (US);
Jacek Grzegorz Smolinski, Jericho, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382144 ; 382224 ;
Abstract
A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.