Brian J Grenon

Title: Innovations by Brian J Grenon

Introduction

Brian J Grenon is a notable inventor based in Colchester, Vermont, who has made significant contributions to the field of photomask repair technology. With a total of 6 patents to his name, Grenon's work focuses on methods that enhance the durability and functionality of photomasks used in various high-tech applications.

Latest Patents

One of Grenon's latest patents involves innovative methods for the repair of photomasks. This method includes providing a coating on the mask to prevent damage to clear regions from various forms of laser ablation splatter, quartz pitting, and gallium staining. The coating can be made from metal, polymer, or carbon materials and is strategically applied to both clear regions and the light-absorbing material of the mask. Notably, a thin copper layer significantly improves imaging with the ion beam while protecting clear regions from FIB stain. Additionally, a photosensitive polymer is utilized to etch opaque defects, with subsequent steps to repair any created clear defects. In another embodiment, opaque defects can be repaired using a short pulse duration laser, ensuring no damage occurs to the underlying quartz or adjacent clear regions.

Career Highlights

Throughout his career, Brian J Grenon has worked with prominent companies such as IBM and Kla Instruments Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in photomask repair.

Collaborations

Grenon has collaborated with notable colleagues, including Jacek G Smolinski and Richard Alan Haight, contributing to advancements in their shared field of expertise.

Conclusion

Brian J Grenon stands out as an influential inventor in the realm of photomask technology, with a focus on innovative repair methods that enhance the performance and longevity of photomasks. His contributions continue to impact the industry positively.