Inventors with similar research interests:
Location History:
- Boise, IA (US) (1993 - 1999)
- Boise, ID (US) (1992 - 2014)
Company Filing History:
Years Active: 1992-2014
Title: J Brett Rolfson: Innovator and Patent Holder in Boise, ID
Introduction:
J Brett Rolfson, a talented innovator hailing from Boise, ID, is recognized for his impressive contributions to the field of attenuated phase shift reticles or photomasks. With a remarkable portfolio of 148 patents, Rolfson has made significant strides in improving the design, fabrication, and utilization of these critical components in the semiconductor industry.
Latest Patents:
Rolfson's recent patents involve pioneering methods for designing, fabricating, and deploying reticles with subdivided blocking regions. These methods aim to minimize or eliminate the problems associated with electrostatic energy buildup, discharge, and damage caused by radiation blocking regions. By subdividing the radiation blocking regions into discrete, spaced apart sections using cut lines, the reticles can effectively prevent radiation from passing through the cut lines between adjacent sections.
Career Highlights:
Throughout his career, Rolfson has made significant contributions to the advancement of semiconductor technology. He has worked with esteemed companies such as Micron Technology Incorporated and Micron Display Technology, Inc. (abbreviated as Micron). At these companies, Rolfson's expertise and innovative thinking have undoubtedly played a pivotal role in pushing the boundaries of reticle design and fabrication.
Collaborations:
J Brett Rolfson's remarkable career has seen him collaborate with other noteworthy individuals in the industry. Notably, he has worked alongside David A Cathey and Tyler A Lowrey, both talented professionals in their own right. These collaborations have enriched the research and development processes, leading to groundbreaking innovations in reticle technology.
Conclusion:
J Brett Rolfson's 148 patents and his dedication to improving the design, fabrication, and utilization of reticles have propelled him to the forefront of the semiconductor industry. His contributions, particularly in the field of subdivided blocking regions, have paved the way for enhanced efficiency and reliability in manufacturing processes. Rolfson continues to leave a lasting impact on the industry, opening the doors for future advancements in the world of attenuated phase shift reticles.
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