Company Filing History:
24 out of 52,735 
2 out of 5 
1 out of 2,916 
Years Active: 1981-2004
Title: The Innovations of Iwao Higashikawa in Semiconductor Technology
Introduction: Iwao Higashikawa, based in Tokyo, Japan, is renowned for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 28 patents to his name, Higashikawa has established himself as a prominent figure in the development of advanced pattern forming methods and apparatus vital for semiconductor devices.
Latest Patents: Among his latest contributions, two notable patents stand out. The first is a "Pattern forming method and pattern forming apparatus," which outlines a method for forming patterns on semiconductor devices. This innovation involves forming a photosensitive film on a substrate and utilizing a beam of a predetermined shape—either a charged particle beam or an electromagnetic beam—to create an exposed region of the desired configuration. The careful repetition of exposure allows the formation of complex patterns crucial for semiconductor functionalities.
The second patent, "Pattern forming method and light exposure apparatus," describes a process for creating a mask pattern on a mask blank. This innovative technique includes forming position measuring marks to detect defects on the main surface of the mask blank, ensuring that any imperfections are accounted for during the exposure process. This meticulous approach helps in achieving high-quality results in semiconductor manufacturing.
Career Highlights: Iwao Higashikawa has held significant roles in esteemed companies such as Kabushiki Kaisha Toshiba and Sortec Corporation. His tenure at these organizations has allowed him to refine his expertise and push the boundaries of semiconductor technology, contributing to the advancement of the industry through his patented inventions.
Collaborations: Throughout his career, Higashikawa has collaborated with notable peers, including Shinichi Ito and Akitoshi Kumagae. These partnerships have fostered a dynamic exchange of ideas and techniques, enhancing the innovation landscape of semiconductor technology.
Conclusion: Iwao Higashikawa's dedication to innovation in semiconductor technology is evident through his extensive number of patents and his impactful work at prominent corporations. His latest developments in pattern forming methods demonstrate his commitment to advancing the field, ensuring that semiconductor devices continue to evolve and meet the demands of modern technology.