The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2001
Filed:
Jan. 28, 2000
Iwao Higashikawa, Tokyo, JP;
Suigen Kyoh, Yokohama, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A main pattern region is projected to a substrate to be exposed while a defective portion including a defect generated in the main pattern region of an original mask is masked. Thereafter, a spare pattern corresponding to the defective portion is further projected on the substrate. In this manner, it is possible to prevent the defect of the main pattern region of the original mask from being transferred to the substrate. The pattern accuracy of the repair portion is the same as that of the exposed portion from the original mask. Therefore, the repair can be made with a high accuracy. Furthermore, it is possible to repair the defect produced at a pattern edge portion with a high accuracy without limitations given by a conventional repair technique.