The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2001
Filed:
Sep. 20, 2000
Applicant:
Inventors:
Hideaki Sakurai, Yokohama, JP;
Shinichi Ito, Yokohama, JP;
Iwao Higashikawa, Tokyo, JP;
Akitoshi Kumagae, Ichikawa, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/02 ; H05B 3/68 ; C23C 1/600 ; F26B 3/30 ;
U.S. Cl.
CPC ...
H05B 3/02 ; H05B 3/68 ; C23C 1/600 ; F26B 3/30 ;
Abstract
Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which a light irradiation treatment is applied to the target substrate a plurality of times such that adjacent light irradiated regions on the target substrate partially overlap with each other and that the adjacent light irradiated regions do not overlap with each other in the light irradiating periods.