The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2003
Filed:
Mar. 07, 2000
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
An exposure method forms a plurality of patterns on a substrate, which is set on a stage of an exposure apparatus, through at least one mask. The method equalizes first positional linear error components of a pattern to be formed by the mask on a first coordinate system defined on the substrate to second positional linear error components of the pattern on a second coordinate system on which the stage is moved, by correcting coordinates for moving the stage on the second coordinate system. The method is capable of aligning the boundaries of patterns with each other on the substrate, to leave only positional linear error components on the patterns. These positional linear error components are removable to leave minimum random residual errors on the patterns, and therefore, the patterns on the substrate are precisely at specified positions.