Ivo Otto, Iv

Title: Ivo Otto, IV: Innovator in Substrate Processing Technologies

Introduction

Ivo Otto, IV, an accomplished inventor based in Albany, NY, has made significant contributions to the field of substrate processing. With a total of two patents to his name, he stands out for his innovative approaches to etching and surface modification in technology.

Latest Patents

Ivo's latest patents demonstrate his expertise and creativity in substrate processing technologies. The first patent focuses on "Substrate Processing with Selective Etching." This innovative approach involves selectively modifying substrate etching processes using nitrogen radicals in a gas phase chemistry etch. The patent outlines how varying selectivities can be achieved in different processes or regions of a substrate through the controlled application of this treatment.

The second patent, "Substrate Processing with Material Modification and Removal," introduces an etch and surface modification method performed in a plasma environment. In this process, ions are removed to allow plasma radicals to create a modified surface layer on the substrate. The gas chemistry then reacts with this modified surface, ultimately resulting in the removal of the reacted layer.

Career Highlights

Currently, Ivo Otto, IV works at Tokyo Electron Limited, where he continues to push the boundaries of substrate processing research. His work not only enhances the efficiency of industrial processes but also contributes significantly to the development of advanced semiconductor technologies.

Collaborations

Throughout his career, Ivo has collaborated with notable professionals in his field, including his coworker Subhadeep Kal. Their combined efforts have fostered innovation and excellence in substrate processing, leading to breakthroughs that have been patent-protected.

Conclusion

Ivo Otto, IV exemplifies the spirit of innovation and ingenuity within the domain of substrate processing. With his two patents, he has established himself as a leading figure in the industry, continuously contributing to the advancements of modern technologies in semiconductor manufacturing. His dedication to research and collaboration signals a promising future in his continuing efforts at Tokyo Electron Limited.