The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Aug. 11, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Ivo Otto, IV, Albany, NY (US);
Subhadeep Kal, Albany, NY (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); H01J 37/32422 (2013.01); H01L 21/0234 (2013.01);
Abstract
An etch and surface modification is performed in a plasma, in which ions have been removed so that radicals of the plasma form a modified surface of a layer of substrate. A gas chemistry is reacted with the modified surface to form a reacted modified surface, and the reacted modified surface is removed.