Isabel Escudero-Sanz

Title: Innovations by Isabel Escudero-Sanz

Introduction

Isabel Escudero-Sanz is a prominent inventor based in Nootdorp, Netherlands. She has made significant contributions to the field of illumination systems, particularly in lithography technology. With a total of 2 patents, her work showcases her expertise and innovative spirit.

Latest Patents

Isabel's latest patents include a multi-mirror system designed for illumination systems, specifically for lithography with wavelengths ≤193 nm. This innovative system features light rays traveling along a light path from an object plane to an image plane. It incorporates an arc-shaped field in the image plane, where a radial direction in the middle of the arc-shaped field defines a scanning direction. The arrangement of the first and second mirrors ensures that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Additionally, the light rays impinge on the mirrors at incidence angles ≤30° or ≥60° relative to the surface normal of the mirrors.

Career Highlights

Isabel currently works at Carl Zeiss SMT AG, a leading company in the field of optical systems and lithography. Her role involves developing advanced technologies that enhance the precision and efficiency of illumination systems. Her contributions have been instrumental in pushing the boundaries of what is possible in lithography.

Collaborations

Isabel has collaborated with notable colleagues such as Martin Antoni and Wolfgang Singer. These partnerships have allowed her to leverage diverse expertise and drive innovation in her projects.

Conclusion

Isabel Escudero-Sanz is a remarkable inventor whose work in illumination systems has made a significant impact in the field of lithography. Her innovative patents and collaborations highlight her dedication to advancing technology.