Carl-zeiss-smt Ag

Isabel Escudero-Sanz

Wolfgang Singer

Johannes Wangler

Martin Antoni

Jörg Schultz

There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths &#x2266;193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles &#x2266;30&#xb0; or &#x2267;60&#xb0; relative to a surface normal of the first and second mirror.

Multi mirror system for an illumination system

There is provided a multi-mirror system for an illumination system with wavelengths &#x2266;193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors &#x2266;30&#xb0; or &#x2267;60&#xb0;.

Growing community of inventors

Nootdorp, Netherlands

Isabel Escudero-Sanz