The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Aug. 19, 2004
Martin Antoni, Aalen, DE;
Isabel Escudero-sanz, Nootdorp, NL;
Wolfgang Singer, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Jörg Schultz, Aalen, DE;
Martin Antoni, Aalen, DE;
Isabel Escudero-Sanz, Nootdorp, NL;
Wolfgang Singer, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Jörg Schultz, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.