The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Jan. 30, 2002
Martin Antoni, Aalen, DE;
Isabel Escudero-sanz, Nootdorp, NL;
Wolfgang Singer, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Jörg Schultz, Aalen, DE;
Martin Antoni, Aalen, DE;
Isabel Escudero-Sanz, Nootdorp, NL;
Wolfgang Singer, Aalen, DE;
Johannes Wangler, Königsbronn, DE;
Jörg Schultz, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.