Saarbruecken, Germany

Igor Hurevich



Average Co-Inventor Count = 14.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014-2018

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4 patents (USPTO):

Title: Igor Hurevich: Innovator in Microlithography

Introduction

Igor Hurevich is a notable inventor based in Saarbruecken, Germany. He has made significant contributions to the field of microlithography, holding a total of 4 patents. His work focuses on advanced illumination systems that enhance the precision and efficiency of lithographic processes.

Latest Patents

Hurevich's latest patents include innovative designs for illumination systems used in microlithography. One of his patents describes a raster arrangement that incorporates at least one raster element of a first type and at least one of a second type. Each raster element of the first type has a unique bundle-influencing effect, while the second type has a different effect. This arrangement allows for improved control over the light used in lithography. Another patent details a microlithography illumination system that features a first raster arrangement with a plurality of bundle-forming raster elements. This system is designed to generate a raster arrangement of secondary light sources, enhancing the transmission of illumination light into the object field.

Career Highlights

Igor Hurevich is currently employed at Carl Zeiss SMT GmbH, a leading company in optical systems and lithography technology. His work at this esteemed organization has positioned him as a key player in the development of cutting-edge microlithography solutions.

Collaborations

Hurevich collaborates with talented professionals in his field, including colleagues Axel Scholz and Frank Schlesener. Their combined expertise contributes to the advancement of innovative technologies in microlithography.

Conclusion

Igor Hurevich's contributions to microlithography through his patents and work at Carl Zeiss SMT GmbH highlight his role as a significant innovator in the field. His advancements continue to influence the future of lithographic technology.

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