The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Sep. 25, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Axel Scholz, Aalen, DE;
Frank Schlesener, Oberkochen, DE;
Nils Haverkamp, Aalen, DE;
Vladimir Davydenko, Bad Herrenalb, DE;
Michael Gerhard, Aalen, DE;
Gerhard-Wilhelm Ziegler, Aalen, DE;
Mirco Kern, Boebingen a.d.R, DE;
Thomas Bischoff, Koenigsbronn, DE;
Thomas Stammler, Aalen, DE;
Stephan Kellner, Westhausen, DE;
Manfred Maul, Aalen, DE;
Daniel Walldorf, Frankfurt, DE;
Igor Hurevich, Saarbruecken, DE;
Markus Deguenther, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.