The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2018

Filed:

Mar. 21, 2017
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Axel Scholz, Aalen, DE;

Frank Schlesener, Oberkochen, DE;

Nils Haverkamp, Aalen, DE;

Vladimir Davydenko, Bad Herrenalb, DE;

Michael Gerhard, Aalen, DE;

Gerhard-Wilhelm Ziegler, Aalen, DE;

Mirco Kern, Boeblingen a.d.R, DE;

Thomas Bischoff, Koenigsbronn, DE;

Thomas Stammler, Aalen, DE;

Stephan Kellner, Westhausen, DE;

Manfred Maul, Aalen, DE;

Daniel Walldorf, Frankfurt, DE;

Igor Hurevich, Saarbruecken, DE;

Markus Deguenther, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/64 (2006.01); G03F 7/20 (2006.01); G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 3/0043 (2013.01); G03F 7/70083 (2013.01);
Abstract

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.


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