Ichiro Shiono

Title: Innovations of Ichiro Shiono in Thin Film Technology

Introduction

Ichiro Shiono is a prominent inventor based in Yokohama, Japan, known for his significant contributions to thin film technology. With a total of seven patents to his name, Shiono has made remarkable advancements in methods and apparatuses for thin film formation.

Latest Patents

Shiono's latest patents include a thin film formation method and a thin film formation apparatus. The thin film formation method aims to improve film formation efficiency by eliminating unnecessary film formation during trial processes. This innovative method involves sputtering targets to create a first thin film on a substrate, which is monitored as it rotates. Following this, the same targets are used to form a second thin film with the same composition, ensuring precise film thickness through various monitoring and calculation steps. The thin film forming apparatus is designed to reduce operational time and costs by allowing film formation only on specific portions of substrates. It features a substrate holding mechanism that ensures optimal exposure of the film forming area while overlapping non-film forming portions.

Career Highlights

Ichiro Shiono has established himself as a key figure in the field of thin film technology through his work at Shincron Co., Ltd. His innovative approaches have not only advanced the technology but have also contributed to the efficiency of manufacturing processes in various industries.

Collaborations

Shiono has collaborated with notable colleagues, including Yousong Jiang and Ekishu Nagae, to further enhance the development of thin film technologies. Their combined expertise has led to significant advancements in the field.

Conclusion

Ichiro Shiono's contributions to thin film technology through his innovative patents and collaborative efforts have made a lasting impact on the industry. His work continues to influence advancements in manufacturing and material science.