The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Jun. 13, 2011
Yohei Hinata, Yokohama, JP;
Kyokuyo Sai, Yokohama, JP;
Yoshiyuki Otaki, Yokohama, JP;
Ichiro Shiono, Yokohama, JP;
Yousong Jiang, Yokohama, JP;
Yohei Hinata, Yokohama, JP;
Kyokuyo Sai, Yokohama, JP;
Yoshiyuki Otaki, Yokohama, JP;
Ichiro Shiono, Yokohama, JP;
Yousong Jiang, Yokohama, JP;
SHINCRON CO., LTD., Kanagawa, JP;
Abstract
A thin film formation method is provided, by which needless film formation due to trial film formation is omitted and film formation efficiency can be improved. This invention is a method for sputtering targets to form a film A having an intended film thickness of Tas the first thin film on a substrate and monitor substrate held and rotated by a rotation drum and, subsequently, furthermore sputtering the targets used in forming the film A to form a film C having an intended film thickness of Tas the second thin film, which is another thin film having the same composition as the film A; comprising film thickness monitoring steps Sand S, a stopping step S, an actual time acquisition step S, an actual rate calculating step Sand a necessary time calculating step S