Saitama, Japan

Ichiro Hayashida



Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 318(Granted Patents)


Location History:

  • Kawagoe, JP (1994 - 1998)
  • Iruma, JP (2009)
  • Saitama, JP (2000 - 2014)
  • Tokyo, JP (2013 - 2014)

Company Filing History:


Years Active: 1994-2014

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15 patents (USPTO):Explore Patents

Title: **Ichiro Hayashida: Innovator in Semiconductor Cleaning Solutions**

Introduction

Ichiro Hayashida is a prominent inventor based in Saitama, Japan, known for his significant contributions to the semiconductor industry. With 15 patents to his name, Hayashida has focused on developing solutions that enhance the cleaning processes used in semiconductor fabrication, ensuring optimal performance and quality of the substrates involved.

Latest Patents

Two of Ichiro Hayashida's latest patents exemplify his innovative approach. The first patent addresses a cleaning agent for substrates and a corresponding cleaning method. This invention effectively removes fine particles and metallic impurities from the surface of substrates, particularly semiconductor substrates, without causing surface roughness or corrosion of the underlying metal wirings. The cleaning agent comprises an organic acid with at least one carboxyl group, a complexing agent, and a selection of organic solvents.

The second patent focuses on an etching agent specifically designed for semiconductor substrates. This etching agent is capable of etching titanium-based metal films while ensuring that a copper anticorrosive component is preserved. The etching method utilizing this agent represents a significant advancement in the field of semiconductor processing.

Career Highlights

Ichiro Hayashida has held positions at Wako Pure Chemical Industries, Inc. and Purex Co., Ltd., where he applied his expertise in developing innovative chemical solutions for semiconductor manufacturing. His work has proven crucial in advancing cleaning and etching technologies that are essential for achieving high-quality semiconductor devices.

Collaborations

Throughout his career, Hayashida has collaborated with notable professionals in the field, including Masahiko Kakizawa and Osamu Ichikawa. These partnerships have contributed to the successful development and refinement of his patented technologies, further indicating his role in fostering innovation within the semiconductor industry.

Conclusion

Ichiro Hayashida's contributions to the semiconductor sector through his innovative cleaning and etching solutions showcase his commitment to advancing technology. His patents not only address pressing challenges in the industry but also pave the way for future innovations. As he continues to push the boundaries of what is possible, Hayashida stands out as a remarkable inventor in the realm of semiconductor technology.

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