Location History:
- San Jose, CA (US) (1993 - 2004)
- Singapore, SG (2002 - 2005)
Company Filing History:
Years Active: 1993-2005
Title: Ian J Morey: Innovator in Semiconductor Processing
Introduction
Ian J Morey, based in Singapore, has made remarkable contributions to the field of semiconductor processing, holding a total of 11 patents. His innovative approaches have advanced the techniques used in etching and photoresist stripping, making significant improvements in the efficiency and effectiveness of integrated circuit fabrication.
Latest Patents
Among his latest patents is a novel methodology titled "Unique process chemistry for etching organic low-k materials." This invention focuses on etching features in integrated circuit wafers while minimizing the micromasking effects. The patented process introduces a flow of etchant gas, which includes fluorocarbon, and utilizes plasma formed in proximity to the wafer. This plasma efficiently etches the features while preventing hardmask components from contaminating the etched area.
Another significant patent is the "Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications." This process innovatively strips photoresist from semiconductor wafers with layers of organosilicate glass dielectric. Its design allows for both in situ and ex situ reactions, employing either oxidative or reductive methods to achieve quicker ash rates and reduced damage to OSG dielectrics compared to traditional techniques.
Career Highlights
Ian J Morey's career has included prestigious roles at renowned companies in the semiconductor industry, notably at Lam Research Corporation and Applied Materials, Inc. His work at these organizations has established him as a leader in developing advanced semiconductor processing techniques.
Collaborations
Throughout his career, Ian has collaborated with notable professionals in the industry, including Janet M Flanner and Susan Ellingboe. These collaborations have fostered innovative ideas and solutions, contributing to the success of various projects in semiconductor technology.
Conclusion
Ian J Morey's extensive portfolio of patents and his dedication to semiconductor processing illustrate his significant impact on the industry. His innovative work continues to pave the way for advancements in integrated circuit fabrication, showcasing the vital role of inventors in technological progress.