I-Ping Lee

Title: I-Ping Lee: Innovator in Semiconductor Technology

Introduction

I-Ping Lee is a prominent inventor based in Taouan, Taiwan, known for his significant contributions to the field of semiconductor technology. With a total of six patents to his name, Lee has developed innovative methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Among his latest patents, Lee has introduced methods for forming semiconductor devices. These methods involve creating a trench in a substrate, which includes a defect protruding from the bottom surface of the trench. The process continues with the application of a flowable material to cover the defect, followed by an etching process to reduce the height of the defect, and finally, the removal of the flowable material. Another notable patent is the method of forming contact using a non-conformal dielectric liner. This method treats contact holes after their formation by depositing a layer of non-conformal dielectric over the surface, resulting in an uneven deposition that prevents the enlargement of the hole diameter during subsequent processing steps.

Career Highlights

I-Ping Lee is currently associated with Vanguard International Semiconductor Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making significant impacts in the industry.

Collaborations

Lee has collaborated with notable colleagues, including Erik S. Jeng and Eddy Chiang, contributing to various projects that push the boundaries of semiconductor innovation.

Conclusion

I-Ping Lee's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.