Hwaseong, South Korea

Hyun-Kyoo Shon

This inventor holds 8 USPTO granted patents. Top assignee: Auros Technology, Inc.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyun-Kyoo Shon. Retrieved from https://idiyas.com/inventor/hyun-kyoo-shon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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8 patents (USPTO):Explore Patents

Title: The Innovations of Hyun-Kyoo Shon

Introduction

Hyun-Kyoo Shon is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of overlay measurement technology, holding a total of seven patents. His work is instrumental in advancing the precision of semiconductor manufacturing processes.

Latest Patents

Among his latest patents is an overlay measurement device and method designed to measure errors between overlay marks on different layers of a wafer. This device includes a light source, an objective lens, a lens focus actuator, an auto focus module, a detector, a transmission and receipt part, and a processor. Another notable patent involves a similar overlay measurement device that utilizes an aperture to modify the beam from the light source for optimal imaging of the overlay marks.

Career Highlights

Hyun-Kyoo Shon is currently employed at Auros Technology, Inc., where he continues to innovate in the field of measurement devices. His expertise in overlay measurement has positioned him as a key figure in the development of advanced semiconductor technologies.

Collaborations

He collaborates with talented coworkers such as Sol-Lee Hwang and Dong-Won Jung, contributing to a dynamic team focused on technological advancements.

Conclusion

Hyun-Kyoo Shon's contributions to overlay measurement technology exemplify his dedication to innovation in the semiconductor industry. His patents reflect a commitment to enhancing precision and efficiency in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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