Hung-Kwei Hu

Title: Innovations of Inventor Hung-Kwei Hu

Introduction

Hung-Kwei Hu is a notable inventor based in Saratoga, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced methods for etching and fabricating integrated circuit structures.

Latest Patents

Among his latest patents is a method of etching shaped features on a substrate. This innovative method involves providing a substrate in a process zone, where the substrate has a pattern of features comprising dielectric covering semiconductor. In the first stage, an energized first etching gas is introduced, which has a selectivity of etching dielectric to semiconductor of at least about 1.8:1. This allows for preferential etching of the dielectric to expose the semiconductor. In the second stage, a second etching gas is used, which has a selectivity of less than about 1:1.8, enabling preferential etching of the semiconductor. Another significant patent involves quasi-damascene gate and self-aligned source/drain methods for fabricating devices, which outlines steps for forming integrated circuit structures on a substrate.

Career Highlights

Hung-Kwei Hu has worked with prominent companies such as Actel Corporation and Hewlett-Packard Company. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Throughout his career, Hung-Kwei Hu has collaborated with notable individuals, including Yeouchung Yen and Shih-Oh Chen. These collaborations have further enhanced his contributions to the field.

Conclusion

Hung-Kwei Hu's innovative work in semiconductor technology and his impressive portfolio of patents highlight his significant impact on the industry. His contributions continue to influence advancements in integrated circuit fabrication methods.