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Taipei, Taiwan

Hung-Ju Chou

This inventor holds 15 USPTO granted patents and 17 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hung-Ju Chou. Retrieved from https://idiyas.com/inventor/hung-ju-chou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 100.0

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Hsinchu, TW (2022 - 2023)
  • Taipei, TW (2019 - 2024)

Company Filing History:

goldMedal15 out of 42,926 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2019-2026

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15 patents (USPTO):Explore Patents
1. 12701775 - Fin loss prevention (2026-08-04),
2. 12641831 - Gate structures of semiconductor devices and fabrication methods thereof (2026-05-26),
3. 12477712 - Memory structure and method for manufacturing the same (2025-11-18),
4. 12324190 - Method and multi-channel devices with anti-punch-through features (2025-06-03),
5. 12206004 - Gate all around device and method of forming the same (2025-01-21),
6. 12136651 - Silicon-germanium Fins and methods of processing the same in field-effect transistors (2024-11-05),
7. 11923250 - Fin loss prevention (2024-03-05),
8. 11854819 - Germanium hump reduction (2023-12-26),
9. 11791336 - Bent fin devices (2023-10-17),
10. 11757018 - Formation method of semiconductor device with gate all around structure (2023-09-12),
11. 11735430 - Fin field-effect transistor device and method (2023-08-22),
12. 11705372 - Fin loss prevention (2023-07-18),
13. 11437245 - Germanium hump reduction (2022-09-06),
14. 10964548 - Fin field-effect transistor device and method (2021-03-30),
15. 10497577 - Fin field-effect transistor device and method (2019-12-03),

Title: Innovations by Hung-Ju Chou: Pioneering Advances in Semiconductor Technology

Introduction: Hung-Ju Chou is a notable inventor based in Taipei, Taiwan, whose contributions to the field of semiconductor technology have led to the granting of 12 patents. His work primarily focuses on methods and devices designed to enhance the performance and reliability of semiconductor components.

Latest Patents: Among Hung-Ju Chou's latest patents are innovative methodologies and devices featuring anti-punch-through characteristics. One significant patent details a comprehensive process that includes the formation of an APT feature in a semiconductor substrate. This patent describes a sophisticated approach to epitaxially growing semiconductor layers, effectively addressing challenges in defining active regions and isolation features. Another notable patent is centered around the development of a gate-all-around device, which encompasses a method for creating fin-shaped structures atop n-well and p-well substrates. This advancement demonstrates his ability to manipulate semiconductor layer thickness to improve device efficiency.

Career Highlights: Hung-Ju Chou works at Taiwan Semiconductor Manufacturing Company Limited, a leading institution in semiconductor manufacturing. His expertise and innovative spirit have contributed to advancements in chip technology and design, making his patents pivotal in modern electronics.

Collaborations: Throughout his career, Hung-Ju has collaborated with esteemed colleagues such as Jiun-Ming Kuo and Chih-Chung Chang. Their teamwork has facilitated the development of cutting-edge technologies that advance the field of semiconductor engineering.

Conclusion: Hung-Ju Chou's inventions and patents significantly influence the semiconductor industry. His dedication to innovation and collaboration not only enhances device performance but also paves the way for future advancements in technology. As an inventor, he stands as a key figure in the ongoing evolution of semiconductor applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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